Technical Name Ultra-Low Frequency Raman Spectroscopy Technology
Project Operator National Taiwan University
Project Host 張玉明
Summary ULF Raman spectroscopy utilizes novel VHG filters to spectrally clean up the laser line before ULF Raman spectroscopy is measured with a single grating spectrometer in conjunction with CCD camera. The availabilityaccessibility of UFL Raman spectroscopy opens new opportunity to reveal key information such as intermolecular structure characterization, pharmaceutical polymorph identification,material phaseinterfacial structure determination.
Scientific Breakthrough We establish the know-how technology to spectrally clean up the laser line down to 10 cm^-1, before one measures ULF Raman spectroscopy with a single grating spectrometer. UFL Raman spectroscopy opens new opportunity to reveal key information such as intermolecular structure characterization, pharmaceutical polymorph identification,material phaseinterfacial structure determination.
Industrial Applicability ULF Raman spectroscopy can reveal key information such as intermolecular structure characterization, polymorph identification,material phaseinterfacial structure determination. The potential applications include : 2D materialstheir van der waals heterostructures, metal halides, pharmaceutical polymorphs, semiconductor structure, graphene, carbon nanotubes,material crystallizationstructural transformation.
Keyword Ultra-low frequency Raman spectroscopy Phonon Nanostructure Emerging material Laser spectroscopy Two-dimensional material Semiconductor van der waals heterostructures pharmaceutical molecule
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